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Silizium-Halbleitertechnologie

  • Textbook
  • © 1996

Overview

Authors:
  1. Ulrich Hilleringmann

    1. Universität Dortmund, Deutschland

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Part of the book series: Teubner Studienbücher Technik (TSTT)

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Table of contents (13 chapters)

  1. Front Matter

    Pages N2-XI
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  2. Einleitung

    • Ulrich Hilleringmann
    Pages 1-3

  3. Herstellung von Siliziumscheiben

    • Ulrich Hilleringmann
    Pages 4-22

  4. Oxidation des dotierten Siliziums

    • Ulrich Hilleringmann
    Pages 23-35

  5. Lithografie

    • Ulrich Hilleringmann
    Pages 36-54

  6. Ätztechnik

    • Ulrich Hilleringmann
    Pages 55-77

  7. Dotiertechniken

    • Ulrich Hilleringmann
    Pages 78-105

  8. Depositionsverfahren

    • Ulrich Hilleringmann
    Pages 106-124

  9. Metallisierung und Kontakte

    • Ulrich Hilleringmann
    Pages 125-138

  10. Scheibenreinigung

    • Ulrich Hilleringmann
    Pages 139-148

  11. MOS-Technologien zur Schaltungsintegration

    • Ulrich Hilleringmann
    Pages 149-177

  12. Erweiterungen zur Höchstintegration

    • Ulrich Hilleringmann
    Pages 178-213

  13. Bipolar-Technologie

    • Ulrich Hilleringmann
    Pages 214-226

  14. Montage Integrierter Schaltungen

    • Ulrich Hilleringmann
    Pages 227-253

  15. Back Matter

    Pages 254-281
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Keywords

Authors and Affiliations

  • Universität Dortmund, Deutschland

    Ulrich Hilleringmann

Bibliographic Information

  • Book Title: Silizium-Halbleitertechnologie

  • Authors: Ulrich Hilleringmann

  • Series Title: Teubner Studienbücher Technik

  • DOI: https://doi.org/10.1007/978-3-663-05853-3

  • Publisher: Vieweg+Teubner Verlag Wiesbaden

  • eBook Packages: Springer Book Archive

  • Copyright Information: Springer Fachmedien Wiesbaden 1996

  • Softcover ISBN: 978-3-519-00149-2Published: 01 September 1995

  • eBook ISBN: 978-3-663-05853-3Published: 09 March 2013

  • Edition Number: 1

  • Number of Pages: XI, 280

  • Number of Illustrations: 177 b/w illustrations

  • Topics: Engineering, general

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